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[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) millingmill system.
[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (ion beam etching) millingmill system.
[* black] The IBE is used to remove layers of semiconductor devices in a controlled and selective manner with very precise and planar results.
[* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 which is fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) [http://en.wikipedia.org/wiki/CMOS|CMOS] process, making this an invaluable tool.
[* black] tl;dr it's an ion blaster[http://images2.wikia.nocookie.net/__cb20110818230218/transformers/images/a/af/Prime-optimusprime-s01e06-ionblaster.jpg|ion blaster].
[* black] tl;dr it's an ion blaster[http://images2.wikia.nocookie.net/__cb20110818230218/transformers/images/a/af/Prime-optimusprime-s01e06-ionblaster.jpg|ion blaster].