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[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (Ion Beam Etchingion beam etching) milling system.
[* black] This is Chipworks' brand new [http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (Ion Beam Etchingion beam etching) milling system.
[* black] The IBE is used to delayer semiconductor devices in a controlled and selective manner with very precise and planar results.
[* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS Processprocess, making this an invaluable tool.
[* black] Yeah,tl;dr it's an ion blaster.
[* black] Today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS Processprocess, making this an invaluable tool.
[* black] Yeah,tl;dr it's an ion blaster.