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Edição por Andrew Optimus Goldheart

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[* black] This ouris Chipworks' brand new IBE[http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (Ion Beam Milling)Etching) milling system.
[* black]
The IBE is used to delayer semiconductor devices in a very controlled and selective manner with very controlledprecise and planar results. As today's
[* black] Today's
semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS ProcProcess, making this an invaluable tool.
[* black] This ouris Chipworks' brand new IBE[http://en.wikipedia.org/wiki/Ion_beam_etching|IBE] (Ion Beam Milling)Etching) milling system.
[* black]
The IBE is used to delayer semiconductor devices in a very controlled and selective manner with very controlledprecise and planar results. As today's
[* black] Today's
semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS ProcProcess, making this an invaluable tool.
[* black] Yeah, it's an ion blaster.