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[* black] Ion BlasterThis our brand new IBE (Ion Beam Milling) system. The IBE is used to delayer semiconductor devices in a very controlled and selective manner with very controlled and planar results. As today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS Proc
[* black] Yeah, it's an ion blaster
.
[* black] Ion BlasterThis our brand new IBE (Ion Beam Milling) system. The IBE is used to delayer semiconductor devices in a very controlled and selective manner with very controlled and planar results. As today's semiconductor devices are constructed from dissimilar materials, like the Apple A6 fabricated with Samsung 32 nm HKMG (Hi dielectric K, Metal Gate) CMOS Proc
[* black] Yeah, it's an ion blaster
.